Metrology of nanoscale grating structures by UV scatterometry

Goniometric scatterometry measurements of gratings with linewidths down to 25 nm on silicon wafers with an inspection wavelength of 266 nm are presented. Data evaluation is performed using FEM based light scattering simulations. As results the reconstruction of the complete cross-section profile is presented.

M. Wurm, et al. Metrology of nanoscale grating structures by UV scatterometry. Opt. Express 25, 2460 (2017).

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