Metrology of nanoscale grating structures by UV scatterometry

Goniometric scatterometry measurements of gratings with linewidths down to 25 nm on silicon wafers with an inspection wavelength of 266 nm are presented. Data evaluation is performed using FEM based light scattering simulations. As results the reconstruction of the complete cross-section profile is presented.

M. Wurm, et al. Metrology of nanoscale grating structures by UV scatterometry. Opt. Express 25, 2460 (2017).

DOI

PDF

logo
Cookies make it easier for us to provide you with our services. With the usage of our services you permit us to use cookies.
More information Ok